Maud Vinet
Quobly (France)
Building industrial-scale quantum computing on silicon

Nicolas Breil
Applied Materials (USA)
Epitaxy process solutions for AI computing applications

Claudia Fleischmann
imec & KU Leuven (Belgium)
From Material Insights to Device Scaling: Grand Challenges and Emerging Solutions in Characterization, Metrology and Inspection

TaeGi Lee
Asahi Kasei Corp. & Nagoya University (Japan)
MOVPE-Grown Pseudomorphic AlN/GaN/AlN HEMTs on AlN Substrates Enabling High Breakdown Field and Collapse-Free Operation

Louis Thuries
Sumitomo (SHI) Material Solutions Europe (France)
How Advanced Laser Annealing Technology Enables AI Performance at Scale

Rami Khazaka
ASM Corporate Research and Development (Belgium)
Enabling Future Technology Nodes Through Ultra Low Temperature Epitaxy

Ray Duffy
Tyndall National Institute & University College Cork (Ireland)
Doping solutions through recrystallisation of amorphous semiconductors; issues and challenges for planar CMOS, thin-body devices, and thin-film materials

Frédéric Boeuf
STMicroelectronics (France)
Silicon Photonics: A Technology for AI-Datacenter Applications and Beyond